ELECTRONIC MICROSCOPY PRODUCTS

More advanced materials and nanotechnology require modern microscopy to solve problems where traditional imaging techniques are less effective.

It is about being able to study complex, nanometric and often very thin materials, which will be charged under the electron beam creating image artifacts, have nanometric characteristics that metallization would hide or modify the surface itself, and in addition many of these characteristics are so fine lines that quickly become transparent to accelerated tensions.

We will need modern FESEM microscopes with all possible capabilities to face these problems, with column detectors that allow signal selection through electronic filtering and that allow us to use beam deceleration systems, and they must also be combined with the most modern systems from EDX.