ELECTRONIC MICROSCOPY PRODUCTS

TESCAN MAGNA

ULTRA HIGH RESOLUTION UHR SEM SCANNING ELECTRON MICROSCOPE WITH SUBNANOMETRIC RESOLUTION

  • High-resolution and high-contrast imaging of nextgen materials (e.g. catalyst structures, nanotubes, nanoparticles and other nanoscale structures)
  • Excellent platform suitable for SEM/STEM metrology at sub-nanometer scale
  • Fast setup of the electron beam – optimal imaging conditions are guaranteed by the In-Flight Beam Tracing™
  • Multi-detector system TriBE™ and TriSE™ for sample nanocharacterization
  • Intuitive software modular platform designed for effortless operation regardless users’ skill level

Technical specifications

Maximum resolution to resolve nanometer-sized features.
The patented Triglav™ SEM column with patented TriLens™ triple lens offers best-in-class versatility. The extraordinary resolution provided by the ultra-high-resolution lens is ideal for detailed morphological characterization, allowing researchers to resolve nanometer-sized features.

A completely new high-resolution analytical lens enables imaging without the application of electromagnetic fields, ideal for observing magnetic samples and used for analytical work (EDS, EBSD). A third objective lens allows for a variety of viewing modes and optimization of spot size and shape to enhance microanalysis.

Different image contrasts for maximum understanding of the sample.
BSE TriBE™ triple detection allows selective collection of signals across angle and energy. The half-angle backscattered electron detectors (ma-BSD) and the BSD In-Beam detector are located inside the column and detect half-angle and axial backscattered electrons, while the BSD detector in the camera detects large-angle backscattered electrons.

SE TriSE™ triple secondary electron detection captures the signal from secondaries optimally in all working modes. The SE In-Beam detector located inside the column allows electron detection at very short working distances. The SE detector in beam deceleration mode (SE BDM) provides maximum resolution in BDM, while the SE detector in the camera provides excellent topographic contrast.

Enhanced and expanded imaging capabilities.
The state-of-the-art Triglav™ column beam detection system has been optimized, resulting in a more than three-fold improvement in signal detection efficiency. Furthermore, detection capabilities have been expanded and it is now possible to detect axial BSE signals filtered by energy bands. This makes scanning with new contrasts possible to provide better surface sensitivity through selective collection of low-loss BSEs.

The best conditions for microanalysis guaranteed.
The new generation Triglav™ also comes with adaptive illumination point optimization, resulting in better resolution at high electron beam currents. Such a feature is beneficial for fast analytical techniques such as EDS, WDS and EBSD. Furthermore, the Schottky gun is capable of generating beam currents of up to 400 nA with rapid beam energy changes, ensuring excellent signal for all microanalytical applications.

Complex applications are now easier than ever.
The new TESCAN Essence™ software platform is a simplified multi-user interface with a graphical layout that allows quick and easy access to key functions. This easy-to-use interface can be customized to best suit specific applications and the user’s skill level and preference. A wide variety of software modules, wizards, and recipes make all SEM applications a simple and easy experience for both experienced and new users, increasing productivity and helping to increase performance in the laboratory.

Need more information?

Download Tescan MAGNA brochure

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